ALR series
Photo orientation Materials
Feature
■ Molecular orientation induced by polarized light
■ High photo-sensitivity: ≧ 20 mJ/cm2
■ Low temp. cure：≦ 120℃
■ High Anchoring energy
■ Photopatternable
Product variation
Product series |
ALR series |
|
|---|---|---|
Type |
Nomal type |
High anchoring type |
Solid Contents |
1~10% |
1~10% |
Viscosity |
1~5 mPa･s |
1~5 mPa･s |
Photo-sensitivity |
≧ 20 mJ/cm2 |
≧ 20 mJ/cm2 |
Transmittance |
≧ 99% |
≧ 99% |
Haze |
< 1% |
< 1% |
Application
■ Optical compensation
■ Patterned retarder film
■ Diffraction grating, Pickup Lens
■ VR/AR devices
* This material was developed with Prof.
Kawatsuki at University of Hyogo in Japan
Patterning Image
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TEL +81-6-6264-5072
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TEL +81-3-6202-7078
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